Asymmetric source/drain depths

ABSTRACT

A method for fabricating a semiconductor device includes forming a relaxed semiconductor layer on a substrate, the substrate comprising an n-type region and a p-type region. The method further includes forming a tensile strained semiconductor layer on the relaxed semiconductor layer, etching a portion of the tensile strained semiconductor layer in the p-type region, forming a compressive strained semiconductor layer on the tensile strained semiconductor layer in the p-type region, forming a first gate in the n-type region and a second gate in the p-type region, and forming a first set of source/drain features adjacent to the first gate and a second set of source/drain features adjacent to the second gate. The second set of source/drain features are deeper than the first set of source/drain features.

PRIORITY INFORMATION

This application is a divisional of U.S. patent application Ser. No.14/582,431 filed Dec. 24, 2014 and entitled “Asymmetric Source/DrainDepths,” the disclosure of which is hereby incorporated by reference inits entirety.

BACKGROUND

Fabrication of integrated circuits involves forming large numbers ofvery small devices on a single wafer. As fabrication technologiesimprove, the devices become smaller such that more devices can fitwithin a smaller amount of space. A commonly formed device is atransistor. A transistor generally includes a gate terminal, a sourceterminal, and a drain terminal. A channel is positioned below the gateand between the source and drain terminals. Based on the signal appliedto the gate, electric current is allowed or prevented from flowingthrough the channel. As the size at which semiconductor devicesdecreases, it is desirable to find methods and structures that allow forcost efficient devices with high performance.

BRIEF DESCRIPTION OF THE DRAWINGS

Aspects of the present disclosure are best understood from the followingdetailed description when read with the accompanying figures. It isnoted that, in accordance with the standard practice in the industry,various features are not drawn to scale. In fact, the dimensions of thevarious features may be arbitrarily increased or reduced for clarity ofdiscussion.

FIGS. 1A, 1B, 1C, 1D, 1E, 1F, 1G, and 1H are diagrams showing anillustrative process for forming devices with asymmetric source/drainfeature depths, according to one example of principles described herein.

FIGS. 2A and 2B are diagrams showing doping concentrations ofsource/drain features, according to one example of principles describedherein.

FIG. 3 is a flowchart showing an illustrative method for forming deviceswith asymmetric source/drain depths, according to one example ofprinciples described herein.

DETAILED DESCRIPTION

The following disclosure provides many different embodiments, orexamples, for implementing different features of the provided subjectmatter. Specific examples of components and arrangements are describedbelow to simplify the present disclosure. These are, of course, merelyexamples and are not intended to be limiting. For example, the formationof a first feature over or on a second feature in the description thatfollows may include embodiments in which the first and second featuresare formed in direct contact, and may also include embodiments in whichadditional features may be formed between the first and second features,such that the first and second features may not be in direct contact. Inaddition, the present disclosure may repeat reference numerals and/orletters in the various examples. This repetition is for the purpose ofsimplicity and clarity and does not in itself dictate a relationshipbetween the various embodiments and/or configurations discussed.

Further, spatially relative terms, such as “beneath,” “below,” “lower,”“above,” “upper” and the like, may be used herein for ease ofdescription to describe one element or feature's relationship to anotherelement(s) or feature(s) as illustrated in the figures. The spatiallyrelative terms are intended to encompass different orientations of thedevice in use or operation in addition to the orientation depicted inthe figures. The apparatus may be otherwise oriented (rotated 90 degreesor at other orientations) and the spatially relative descriptors usedherein may likewise be interpreted accordingly.

According to principles described herein, a semiconductor device hassource/drain features that are at different depths between p-type andn-type transistors. Specifically, n-type devices have shallowersource/drain features than p-type devices. The source/drain features ofthe n-type devices and p-type devices may vary in other ways to improvethe performance of the devices. For example, the source/drain featuresof the n-type devices may have rounded profiles while the source/drainfeatures of the p-type devices may have a profile with a tip or vertex.

FIGS. 1A-1H are diagrams showing an illustrative process for formingdevices with asymmetric source/drain feature depths. FIG. 1A illustratesa semiconductor substrate 102 having an n-type region 101 and a p-typeregion 103. The semiconductor substrate 102 has a relaxed semiconductorlayer 104 disposed thereon. A tensile strained semiconductor layer 106is disposed on the relaxed semiconductor layer 104.

The semiconductor substrate 102 may be part of a semiconductor wafer.The semiconductor substrate 102 is made of a semiconductor material suchas silicon. Other types of semiconductor material may be used as well.The semiconductor substrate 102 has an n-type region, meaning that it isintended for use with n-type transistors. Thus, the n-type regionincludes a p-well. The p-well is a portion of the semiconductor that isdoped with p-type dopants such as boron. Additionally, the semiconductorsubstrate 102 also includes a p-type region, meaning that it is intendedfor use with p-type transistors. Thus, the p-type region may include ann-well. The n-well is a portion of the semiconductor substrate that isdoped with n-type dopants such as arsenic and phosphorous.

The relaxed semiconductor layer 104 is formed on the semiconductorsubstrate 102. The relaxed semiconductor layer 104 may have a thicknessthat is greater than one micrometer. The relaxed semiconductor layer 104may be formed through an epitaxial growth process. An epitaxial growthprocess is a process by which one crystal material is grown on thesurface of a substrate crystal material, sometimes referred to as theseed crystal. An epitaxial layer may be grown through use of gaseous orliquid precursors. The material being deposited will lock onto thecrystal structure of the seed crystal. An epitaxial grown layer may bedoped in-situ by adding dopant-containing species to the source gas.

The relaxed semiconductor layer 104 may be made of, for example, silicongermanium. The addition of germanium into the silicon affects thelattice constant of the crystal structure. The lattice constant is thedistance from a point within a unit of the crystal structure to thecorresponding point of an adjacent unit of the crystal structure. Forexample, the lattice constant may be measured from the center of oneunit to the center of an adjacent unit. The relaxed semiconductor layer104 is referred to as such because it has a larger lattice constant thanthat of adjacent layers. The lattice constant of the relaxedsemiconductor layer 104 can be tuned by adjusting the concentration ofgermanium within the semiconductor layer. The relaxed semiconductorlayer 104 may be made of a variety of other materials besides silicongermanium. For example, the relaxed semiconductor material 104 may bemade of indium gallium phosphorous (InGaP), indium arsenic (InAs),indium phosphorous (InP), indium gallium arsenic (InGaAs), galliumarsenic (GaAs), indium antimony (InSb), gallium antimony (GaSb),aluminum gallium arsenic (AlGaAs), and other suitable materials.

The tensile strained layer 106 is epitaxially grown on the relaxedsemiconductor layer 104. The tensile strained layer may have a thicknesswithin a range of about 40-100 nanometers. The tensile strainedsemiconductor layer 106 is under tensile strain because it has a smallerlattice constant than the relaxed semiconductor layer 104. Thus, duringthe epitaxial growth process, when the crystal structure of the tensilestrained semiconductor layer 106 locks on to the crystal structure ofthe underlying relaxed semiconductor layer 104, the units of the tensilestrained semiconductor layer 106 are pulled slightly apart, thus causingtensile strain. Such tensile strain is ideal for the channel of n-typedevices. The tensile strained semiconductor layer 106 may be made of avariety of other materials besides silicon. For example, the tensilestrained semiconductor material 106 may be made of indium galliumphosphorous (InGaP), indium arsenic (InAs), indium phosphorous (InP),indium gallium arsenic (InGaAs), gallium arsenic (GaAs), indium antimony(InSb), gallium antimony (GaSb), aluminum gallium arsenic (AlGaAs), andother suitable materials.

FIG. 1B is a diagram showing formation of an isolation structure 108between the n-type region 101 and the p-type region. Isolationstructures can be patterned to form and isolate various features withinthe integrated circuit. The isolation structure may be, for example, ashallow trench isolation (STI) structure. Such a structure is formed byetching a shallow trench within the substrate. The trench is then filledwith a dielectric material. The dielectric material does not conductelectric current and thus effectively electrically isolates devices fromeach other. Then, a Chemical Mechanical Polishing (CMP) process isperformed on the substrate to planarize the surface of the STIstructure. A CMP process involves a slurry that includes both abrasivesand chemical etchants. The abrasives perform the mechanical part of theCMP process and the chemical etchants perform the chemical part of theCMP process. A polishing pad then polishes the surface while the CMPslurry is applied.

FIG. 1C is a diagram showing an illustrative etching process 110 toremove a portion of the tensile strained semiconductor layer 106 withinthe p-type region. P-type devices can operate more efficiently withcompressive strained channels rather than tensile strained channels.Thus, it is desirable to replace the tensile strained channel with acompressive strained channel.

The etching process 110 may be a dry etching process, in which materialfrom the tensile strained semiconductor layer 106 is removed using abombardment of ions. Dry etching is anisotropic and thus etchesprimarily in a single direction. The etching process 110 can be appliedin the appropriate location through use of various photolithographictechniques. For example, a mask (not shown) may be used to cover then-type region while the etching process is performed on the p-typeregion. Such a mask layer may be formed by depositing the mask materialover the entire wafer. Then, a photoresist layer is applied. Thephotoresist layer is then exposed to a light source through use of aphotomask. The photomask is patterned such that some portions of thephotoresist are exposed to light and some portions are not. A developingsolution is then used to remove the weaker portions of the photoresistlayer. An etching process can then be performed to remove the hard maskfrom regions that are not covered by the photoresist layer. Then, thephotoresist layer can be removed, thus leaving the patterned hard mask.

FIG. 1D is a diagram showing an epitaxial growth process 112 by which acompressive strained semiconductor layer 114 is formed. The compressivestrained semiconductor layer 114 has a greater lattice constant thanthat of the tensile strained semiconductor layer 106. Thus, when thecompressive strained semiconductor layer 114 is epitaxially grown on thetensile strained semiconductor layer 106, the units of the compressivestrained semiconductor layer 114 lock onto the units of the tensilestrained semiconductor layer 106, thus causing compressive strain. Thecompressive strained semiconductor layer 114 may be made of, forexample, silicon germanium. The ratio of silicon to germanium may betuned to achieve the desired lattice constant. The compressive strainedsemiconductor 114 layer may be made of a variety of other materialsbesides silicon germanium. For example, the compressive strainedsemiconductor material may be made of pure germanium (Ge), germanium tin(GeSn) indium gallium phosphorous (InGaP), indium arsenic (InAs), indiumphosphorous (InP), indium gallium arsenic (InGaAs), gallium arsenic(GaAs), indium antimony (InSb), gallium antimony (GaSb), aluminumgallium arsenic (AlGaAs), and other suitable materials. The compressivestrained semiconductor layer may have a thickness within a range ofabout 30-90 nanometers.

FIG. 1E is a diagram showing an illustrative finFET (fin Field EffectTransistor) formation process. This is done by performing an etchingprocess 116 to remove portions of the isolation structures 108. Theetching process 116 is selective such that the material forming theisolation structures is removed while the remaining features are leftsubstantially intact. Specifically, the etching process 116 will leavethe tensile strained semiconductor layer 106 and the compressivestrained semiconductor layer 114 substantially intact. The result theformation of a first fin-like structure 111 in the n-type region 101 anda second fin-like structure 113 in the p-type region 103. The fin-likestructures protrude from the surface of the isolation structures 108 toform fin-like shapes. Such fin-like shapes can provide a number ofbenefits to transistor devices.

FIG. 1F is a diagram showing formation of gates 120 on the fin-likestructures 111, 113. Specifically, a first gate 102-1 is formed in then-type region 101 on the first fin-like feature 111. A second gate 102-2is formed in the p-type region 103 on the second fin-like feature 113.In one example, the gates 120 run perpendicular to the underlyingfin-like features 111, 113. The gates 120 may also have sidewall spacers122 formed thereon. The sidewall spacers 122 may be used for a varietyof purposes, including defining where source/drain features are to beformed. In some examples, the gates 120 are dummy gates that will bereplaced with metal gates at a further point in the fabrication process.The dummy gates may be made of a material such as polysilicon. Becausethe high temperatures involved in various annealing processes can damagea metal gate, a dummy gate is formed and then replaced with a metal gateafter the annealing processes have been performed.

FIG. 1G is a diagram showing formation of source/drain features 124 inthe n-type region. In one example, before performing processes in then-type region, a mask layer (not shown) is deposited on the wafer andthen patterned so that it covers the p-type region 103 and exposes then-type region. The mask may be made of, for example, silicon dioxide(SiO₂) or silicon nitride (Si₃N₄). The mask may be patterned usingvarious photolithographic techniques. For example, as described above, aphotoresist layer may be deposited over the mask, exposed to a lightsource through use of a photomask, and then developed so that thephotoresist layer exposes portions of the mask that are to be removed.An etching process then removes the mask from the exposed region. Thephotoresist layer can then be removed.

The source/drain features 124 are formed by first etching a portion ofthe tensile strained semiconductor layer 106 to form a recess. Therecess may be formed to a specific depth 132 by tuning the etchingprocess. Additionally, the recess may be formed with a rounded profile.The recess is then filled with the source/drain material. Thesource/drain material may be formed in the recess using an epitaxialgrowth process. The source/drain material for the n-type region can be amaterial that has a smaller lattice constant than that of the tensilestrained semiconductor layer 106. For example, the source/drain features124 may be made of silicon carbon (SiC). This produces even more tensilestrain on the channel between the source/drain features 124. This isbecause the channel material tends to swell as the source/drain features124 tend to shrink.

The source/drain features 124 are also doped with an n-type dopant suchas boron. The doping of the source/drain features 124 may be performedin-situ with the epitaxial growth process. Alternatively, the doping ofthe source/drain features 124 may be performed in a separate processafter the source/drain features have been epitaxially grown.

FIG. 1H is a diagram showing formation of source/drain features 126 inthe p-type region 103. In one example, before performing processes inthe p-type region, a second mask layer (not shown) is deposited on thewafer and then patterned so that it covers the n-type region 101 andexposes the p-type region 103.

The source/drain features 126 are formed by first etching a portion ofthe compressive strained semiconductor layer 114 to form a recess. Therecess may be formed to a specific depth 134. Additionally, the recessmay be performed with a specific profile. For example, the profile mayhave a lower portion 130 and an upper portion 128. The lower portion 130has a straight profile. The upper portion has a profile with a vertex ortip pointing towards the channel.

The profile of the upper portion 128 may be formed by a multi-stepetching process that involves both wet etching and dry etching. Forexample, the etching process to form the recesses of the source/drainfeatures 126 can alternate between wet etching and dry etching steps.Wet etching uses chemical etchants to remove material. Wet etching isisotropic and thus will generally etch in all directions. But, thecrystal structure of the material being moved can affect the etchingrates in different directions. For example, the etching rate along oneaxis may be different than an etching rate along a different axis. Thus,by tuning the crystal structure of the compressive strainedsemiconductor layer 114 and the tensile strained semiconductor layer106, as well as tuning the multi-step etching process, the desiredprofile can be achieved.

The recess is then filled with the source/drain material. Thesource/drain material may be formed in the recess using an epitaxialgrowth process. The source/drain material for the p-type region can be amaterial that has a greater lattice constant than that of thecompressive strained semiconductor layer 114. For example, thesource/drain features 126 may be made of silicon germanium. But, thesilicon germanium of the source/drain features 126 may have a higherconcentration of germanium than that of the silicon germanium of thecompressive strained semiconductor layer 114, which causes it to have agreater lattice constant. This causes the channel between the p-typesource/drain features 126 to be even more compressed.

The source/drain features 126 are also doped with a p-type dopant suchas phosphorous. The doping of the source/drain features 126 may beperformed in-situ with the epitaxial growth process. Alternatively, thedoping of the source/drain features 126 may be performed in a separateprocess after the source/drain features 126 have been epitaxially grown.

Because the recess for the p-type source/drain features 126 is formed ata depth 134 that is deeper than the depth at which the recess for then-type source/drain features 124 are formed, the p-type source/drainfeatures extend deeper than the n-type source/drain features 124. In thepresent example, the n-type source drain regions do not extend into therelaxed semiconductor layer 104. The p-type source/drain features,however, do extend into the relaxed semiconductor layer 104.

Due to the different types of profiles, the channel length 136 for then-type device 111 is different than the channel length 138 of the p-typedevice 113. Specifically, the channel length 138 of the p-type device113 is smaller than the channel length 136 of the n-type device 111. Thesmaller channel length 138 of the p-type device 113 helps improve theperformance of the p-type device 113.

According to principles described herein, there are asymmetric depthsbetween the source/drain features 124 of the n-type region and thesource/drain features 126 of the p-type region. The asymmetric depthsallow for optimization of the channel strain between the n-type andp-type devices, particularly, transistors. In one example, the depth ofthe source/drain features 124 in the n-type region 101 is within a rangeof about 30-60 nanometers. In one example, the depth of the source/drainfeatures 126 in the p-type region is within a range of about 40-100nanometers.

FIGS. 2A-2B are diagrams showing doping concentrations of source/drainfeatures. FIG. 2A is a diagram showing illustrative dopingconcentrations for the n-type region 101. According to the presentexample, the source/drain features 124 have a doping concentration ofabout 3×10²¹/cm³. Additionally, the source/drain features have a lowerportion 202 with a lower concentration along the bottom of thesource/drain features 124. This lower portion 202 may have aconcentration of about 7×10²⁰/cm³. In some examples, the lower portions202 are formed first, and are doped with the appropriate dopingconcentration. Then, the rest of the source/drain features 124 areformed with the appropriate doping concentration.

FIG. 2B is a diagram showing illustrative doping concentrations for thep-type region 103. According to the present example, the source/drainfeatures 126 have a doping concentration of about 6×10²⁰/cm³.Additionally, the source/drain features have upper portions 204 with ahigher concentration along the top of the source/drain features 126.These upper portions 204 may have a concentration of about 1×10²¹/cm³.In some examples, the lower portions of the source/drain features 126are formed with the appropriate doping concentration. Then, the upperportions 204 of the source/drain features 126 are formed with theappropriate doping concentration. Thus, both the n-type source/drainfeatures 124 and the p-type source/drain features have a higher dopingconcentration towards the top than at the bottom.

FIG. 3 is a flowchart showing an illustrative method for formingdevices, such as transistors, with asymmetric source/drain depths.According to the present example, the method 300 includes a step 302 forforming a relaxed semiconductor layer on a substrate, the substratecomprising an n-type region and a p-type region. The n-type region isintended for n-type devices and thus includes a p-well. The p-typeregion is intended for p-type devices and thus includes an n-well. Insome examples, the n-type region and the p-type region are separated byan isolation structure such as an STI region. The relaxed semiconductorlayer may be made of silicon germanium, for example. The relaxedsemiconductor layer may be formed using an epitaxial growth process.

The method 300 further includes a step 304 for forming a tensilestrained semiconductor layer on the relaxed semiconductor layer. Thetensile strained semiconductor layer may be formed using an epitaxialgrowth process. The tensile strained semiconductor layer has a smallerlattice constant than the relaxed semiconductor layer, thus causing thetensile strain. The tensile strained semiconductor layer can be used asa channel material for n-type transistors.

The method 300 further includes a step 306 for etching a portion of thetensile strained semiconductor layer. This is done in the p-type regionwhere a p-type device is to be formed. The etching may be done throughuse of a dry etching process. Other etching processes may be used aswell.

The method 300 further includes a step 308 for forming a compressivestrained semiconductor layer on the tensile strained semiconductor layerin the p-type region where the portion of the tensile strainedsemiconductor material was removed. The compressive strainedsemiconductor layer has a greater lattice constant than that of thetensile strained semiconductor layer, which causes the compressivestrain.

The method further includes a step 310 for forming a first gate in then-type region and a second gate in the p-type region. The gates mayinclude gate spacers. In some examples, before the gates are formed, theisolation structures are partially etched back so that the semiconductorfeatures form fin-like structures.

The method 300 further includes a step 312 for forming a first set ofsource/drain features adjacent to the first gate and a second set ofsource/drain features adjacent to the second gate, the second set ofsource/drain features being deeper than the first set of source/drainfeatures. By having the source/drain features of the p-type devicedeeper than the source/drain features of the n-type device, the channelstrain for respective devices can be optimized. Specifically,performance is enhanced in n-type devices when the channel is tensilestrained. Conversely, performance is enhanced in p-type devices when thechannel is compressive strained. The material for the source/drainfeatures in the n-type device can be selected to further enhance thetensile strain by having a material with a smaller lattice constant thanthat of the channel. Likewise, the material for the source/drainfeatures in the p-type device can be selected to enhance the compressivestrain by having a material with a larger lattice constant than that ofthe channel.

Additionally, the profile of the source/drain features between the twodifferent sets of source/drain features. Specifically, the source/drainfeatures for the n-type device may have rounded profiles and thesource/drain features for the p-type device may have a vertex or tip.Furthermore, the channel length for the p-type devices may be smallerthan the channel length for the n-type devices. In some examples, thedoping concentration may also be graded. Specifically there may be ahigher doping concentration towards the top of the source/drain region.Moreover, the gradient profile may differ between the source/drainfeatures of the n-type device and the source/drain features of thep-type device.

According to one example, a semiconductor device includes a relaxedsemiconductor layer on a substrate, the substrate comprising an n-typeregion and a p-type region, a tensile strained semiconductor layer onthe relaxed semiconductor layer, a compressive strained semiconductorlayer on the tensile strained semiconductor layer in the p-type region,a first gate in the n-type region and a second gate in the p-typeregion, and a first set of source/drain features adjacent to the firstgate and a second set of source/drain features adjacent to the secondgate, the second set of source/drain features being deeper than thefirst set of source/drain features.

According to one example, a semiconductor device includes a substratehaving a first region and a second region, an n-type transistor in thefirst region, the n-type transistor comprising a first set ofsource/drain features, and a p-type transistor in the second region, thep-type transistor comprising a second set of source/drain features. Thesecond set of source/drain features extend deeper than the first set ofsource/drain features.

According to one example, a method of fabricating a semiconductor deviceincludes forming a relaxed semiconductor layer on a substrate, thesubstrate comprising an n-type region and a p-type region, forming atensile strained semiconductor layer on the relaxed semiconductor layer,etching a portion of the tensile strained semiconductor layer in thep-type region, forming a compressive strained semiconductor layer on thetensile strained semiconductor layer in the p-type region, forming afirst gate in the n-type region and a second gate in the p-type region,forming a first set of source/drain features adjacent to the first gateand a second set of source/drain features adjacent to the second gate,the second set of source/drain features being deeper than the first setof source/drain features.

The foregoing outlines features of several embodiments so that thoseskilled in the art may better understand the aspects of the presentdisclosure. Those skilled in the art should appreciate that they mayreadily use the present disclosure as a basis for designing or modifyingother processes and structures for carrying out the same purposes and/orachieving the same advantages of the embodiments introduced herein.Those skilled in the art should also realize that such equivalentconstructions do not depart from the spirit and scope of the presentdisclosure, and that they may make various changes, substitutions, andalterations herein without departing from the spirit and scope of thepresent disclosure.

What is claimed is:
 1. A method for forming a semiconductor device, themethod comprising: forming a relaxed semiconductor layer on a substrate,the substrate comprising an n-type region and a p-type region; forming atensile strained semiconductor layer on the relaxed semiconductor layer;forming a compressive strained semiconductor layer on the tensilestrained semiconductor layer in the p-type region; forming a first gatein the n-type region and a second gate in the p-type region; and forminga first set of source/drain features adjacent to the first gate and asecond set of source/drain features adjacent to the second gate, thesecond set of source/drain features being deeper than the first set ofsource/drain features, wherein a channel length between the first set ofsource/drain features is greater than a channel length between thesecond set of source/drain features.
 2. The method of claim 1, furthercomprising, an isolation structure between the p-type region and then-type region.
 3. The method of claim 1, wherein the second set ofsource/drain features comprise a tip-shaped profile.
 4. The method ofclaim 3, wherein the tip-shaped profile is in an upper portion of thesecond set of source/drain features and a lower portion of the secondset of source/drain features comprises a straight profile.
 5. The methodof claim 1, wherein the first set of source/drain features have arounded profile on a side that faces a channel between the first set ofsource/drain features.
 6. The method of claim 1, wherein a latticeconstant of the tensile strained semiconductor layer is less than alattice constant of the relaxed semiconductor layer.
 7. The method ofclaim 1, wherein a lattice constant of the compressive strainedsemiconductor layer is greater than a lattice constant of the relaxedsemiconductor layer.
 8. The method of claim 1, wherein a latticeconstant of the first set of source/drain features is less than alattice constant of the tensile strained semiconductor layer.
 9. Themethod of claim 1, wherein a lattice constant of the second set ofsource/drain features is greater than a lattice constant of thecompressive strained semiconductor layer.
 10. The method of claim 1,wherein the first set of source/drain features and the second set ofsource/drain features have a higher dopant concentration on top than onbottom.
 11. The method of claim 1, wherein the first set of source/drainfeatures do not extend to the relaxed semiconductor layer.
 12. Themethod of claim 1, wherein the second set of source/drain featuresextends into the relaxed semiconductor layer.
 13. A method for forming asemiconductor device, the method comprising: providing a substratehaving a first region and a second region; forming an n-type transistorin the first region, the n-type transistor comprising a first set ofsource/drain features; and forming a p-type transistor in the secondregion, the p-type transistor comprising a second set of source/drainfeatures; wherein the second set of source/drain features extend deeperthan the first set of source/drain features.
 14. The method of claim 13,wherein the p-type transistor and the n-type transistor are fin FieldEffect Transistors (finFETs).
 15. The method of claim 13, wherein achannel of the n-type transistor comprises a tensile strained materialand a channel of the p-type transistor comprises a compressive strainedmaterial.
 16. The method of claim 13, wherein a portion along a bottomof the first set of source/drain features comprises a higherconcentration of n-type dopants than a remaining portion of the firstset of source/drain features.
 17. The method of claim 13, wherein aportion along a top of the second set of source/drain features comprisesa higher concentration of p-type dopants than a remaining portion of thesecond set of source/drain features.
 18. A method of fabricating asemiconductor device, the method comprising: forming a relaxedsemiconductor layer on a substrate, the substrate comprising an n-typeregion and a p-type region; forming a tensile strained semiconductorlayer on the relaxed semiconductor layer; etching a portion of thetensile strained semiconductor layer in the p-type region; forming acompressive strained semiconductor layer on the tensile strainedsemiconductor layer in the p-type region; forming a first gate in then-type region and a second gate in the p-type region; forming a firstset of source/drain features adjacent to the first gate and a second setof source/drain features adjacent to the second gate, the second set ofsource/drain features being deeper than the first set of source/drainfeatures.
 19. The method of claim 18, further comprising, forming anisolation structure between the p-type region and the n-type region. 20.The method of claim 19, further comprising, after forming thecompressive semiconductor layer, etching the isolation structure to forma first fin-like structure in the n-type region and a second fin-likestructure in the p-type region.